Reduction of Multiple Interference Effect for Lithography
نویسندگان
چکیده
To reduce critical dimension (CD) variation due to multiple interference effect, anti-reflective coatingl) and over coating processes2) have been proposed and investigated. In this paper, we discuss the problem of the over coating processes and report a new and simple process, called OCT (Optical-path Control Technique), for reducing the multiple interference effect that does not require new material and equipment. CD variation can be reduced to 30% using OCT process. Furthermore, we discuss its application to an experimental 64MDRAM process.
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